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Atomic layer deposited Mo2N thin films using Mo(CO)(6) and NH3 plasma as a Cu diffusion barrier File

Joo, Yong-Hwan , Nandi, Dip K. , Ramesh, Rahul , Jang, Yujin , Bae, Jong-Seong , Cheon, Taehoon , Kim, Soo-Hyun

Article Issue Date2021-03 View1
Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru-Interconnects File

Kim, Youn-Hye , Kim, Minsu , Kotsugi, Yohei , Cheon, Taehoon , Mohapatra, Debananda , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Ramesh, Rahul , An, Ki-Seok , et al

Article Issue Date2022-10 View19
Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen File

Park, Na-Yeon , Kim, Minsu , Kim, Youn-Hye , Ramesh, Rahul , Nandi, Dip K. , Tsugawa, Tomohiro , Shigetomi, Toshiyuki , Suzuki, Kazuharu , Harada, Ryosuke , Kim, Miso , et al

Article Issue Date2022-02 View13
Atomic Layer Deposition of Ru for Replacing Cu-Interconnects File

Kotsugi, Yohei , Han, Seung-Min , Kim, Youn-Hye , Cheon, Taehoon , Nandi, Dip K. , Ramesh, Rahul , Yu, Neung-Kyung , Son, Kirak , Tsugawa, Tomohiro , Ohtake, Shigeyuki , et al

Article Issue Date2021-07 View2
Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H2S: thin film catalyst for water splitting File

Kim, Deok-Hyun , Ramesh, Rahul , Nandi, Dip K. , Bae, Jong-Seong , Kim, Soo-Hyun

Article Issue Date2021-02 View2
Atomic-Layer-Deposited MoNx Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction File

Ramesh, Rahul , Nandi, Dip K. , Kim, Tae Hyun , Cheon, Taehoon , Oh, Jihun , Kim, Soo-Hyun

Article Issue Date2019-05 View3
Hydrogen Evolution Reaction by Atomic Layer-Deposited MoNx on Porous Carbon Substrates: The Effects of Porosity and Annealing on Catalyst Activity and Stability File

Ramesh, Rahul , Sawant, Sandesh Y. , Nandi, Dip K. , Kim, Tae Hyun , Kim, Deok Hyun , Han, Seung-Min , Jang, Yujin , Ha, Myoung Gyu , Cho, Moo Hwan , Yoon, Taeho , et al

Article Issue Date2020-08 View4
Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices File

Ansari, Mohd Zahid , Nandi, Dip K. , Janicek, Petr , Ansari, Sajid Ali , Ramesh, Rahul , Cheon, Taehoon , Shong, Bonggeun , Kim, Soo-Hyun

Article Issue Date2019-11 View6
Preparation of tungsten-based thin films using a F-free W precursor and tert-butyl hydrazine via 2-and 3-step atomic layer deposition process File

Lee, Jin-Hyeok , Hidayat, Romel , Ramesh, Rahul , Roh, Hyeonsu , Nandi, Dip K. , Lee, Won-Jun , Kim, Soo-Hyun

Article Issue Date2022-03 View12
Some Insights into Atomic Layer Deposition of MoNx Using Mo(CO)(6) and NH3 and Its Diffusion Barrier Application File

Tae Hyun Kim , Nandi, Dip K. , Ramesh, Rahul , Han, Seung-Min , Shong, Bonggeun , Kim, Soo-Hyun

Article Issue Date2019-10 View0
Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction File

Ramesh, Rahul , Han, Seungmin , Nandi, Dip K. , Sawant, Sandesh Y. , Kim, Deok Hyun , Cheon, Taehoon , Cho, Moo Hwan , Harada, Ryosuke , Shigetomi, Toshiyuki , Suzuki, Kazuharu , et al

Article Issue Date2021-02 View4
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